@misc{Sakowska_Halina_Poprawa_2012,
 author={Sakowska Halina},
 volume={40},
 editor={Mazur Krystyna},
 editor={Teklińska Dominika},
 editor={Wierzchowski Wojciech},
 editor={Wieteska Krzysztof},
 editor={Gała Maciej},
 number={2},
 copyright={Rights Reserved - Free Access},
 address={Warszawa},
 journal={Electronic Materials},
 howpublished={online},
 year={2012},
 publisher={ITME},
 language={pol},
 type={Text},
 title={Poprawa jakości polerowanych płytek SiC metodą chemicznego utleniania i obróbki termicznej. Badania jakości powierzchni metodami rentgenowskimi = Improvement of the quality of SiC wafers polished using chemical oxidation and heat treatment. Examination of the quality of the surface using X-ray technoques},
 URL={http://www.rcin.org.pl/Content/27918/PDF/WA901_46202_M1_r2012-t40-z2_Mater-Elektron-Sako_i.pdf},
 keywords={Electronic - journal - materials, Electronic - materials, SiC, catalytic oxidation, polishing},
}