@misc{Góra_Krzysztof_Zastosowanie_2011,
 author={Góra Krzysztof},
 volume={39},
 editor={Kozłowski Andrzej},
 number={2},
 copyright={Rights Reserved - Free Access},
 address={Warszawa},
 journal={Electronic Materials},
 howpublished={online},
 year={2011},
 publisher={ITME},
 language={pol},
 type={Text},
 title={Zastosowanie procesu Boscha do plazmowego trawienia krzemu = Bosch process for silicon plasma etching},
 URL={http://www.rcin.org.pl/Content/27813/PDF/WA901_17044_M1_r2011-t39-z2_Mater-Elektron-Gora_i.pdf},
 keywords={Electronic - journal - materials, Electronic - materials, Bosch process, ICP OES, plasma etching, high aspect ratio},
}