@misc{Stańczyk_Beata_Otrzymywanie_2011,
 author={Stańczyk Beata},
 volume={39},
 number={2},
 copyright={Rights Reserved - Free Access},
 address={Warszawa},
 journal={Electronic Materials},
 howpublished={online},
 year={2011},
 publisher={ITME},
 language={pol},
 type={Text},
 title={Otrzymywanie warstw SiCN metoda RF sputteringu = SiCN films deposited by RF magnetron sputtering},
 URL={http://www.rcin.org.pl/Content/27810/PDF/WA901_17039_M1_r2011-t39-z2_Mater-Elektron-Stan_i.pdf},
 keywords={Electronic - journal - materials, Electronic - materials, RF sputtering, SiCN, absorption spectrum, IR spectrum, x-ray diffraction, SIMS},
}