@misc{Flakus_Iwona_Ocena_1980,
 author={Flakus Iwona},
 volume={25},
 editor={Kończyk Sławomir},
 editor={Waczyński Krzysztof},
 editor={Rećko Wacław Marek},
 number={1},
 copyright={Rights Reserved - Free Access},
 journal={Electronic Materials},
 address={Warszawa},
 howpublished={online},
 year={1980},
 publisher={Wydaw. Przemysłu Maszynowego "WEMA"},
 language={pol},
 title={Ocena przydatności płytkowego źródła domieszek fosforu do krzemu = Evaluation of possibility to dope silicon wiyh ohosphorus from solid planar diffusion source},
 type={Text},
 URL={http://www.rcin.org.pl/Content/18455/PDF/WA901_11452_M1_r1979-z1-25_Mater-Elektron-Flak_i.pdf},
 keywords={Electronic - journal - materials, Electronic - materials, silicon doping, phosphorus},
}